The Sirus T2 Reactive Ion Etcher is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment.
Applications: MEMS, Solid State Lighting,...
|
Surface Finish |
The Gemini is the most compact, inexpensive and versatile system, which can handle 100-300mm wafers. This multi-chamber, high throughput stripping system is designed specifically for the demands of today's production fabs. By employing ICP, microwave and RF bias power as needed, difficult to ...
|
Cleaning Equipment |
The Titan is a very compact, fully automated, vacuum loadlocked plasma system for semi-conductor production. Available in either Reactive Ion Etch (RIE) configuration, High Density Inductive Coupled Plasma (HDICP) or Plasma Enhanced Chemical Vapor Deposition (PECVD) configuration. Used for advanc...
|
Surface Finish |
The Oracle is the smallest and most flexible full production cluster system on the market. The system consists of a central vacuum transport (CVT), vacuum cassette elevators and up to four process reactors. These process reactors are docked to the central load-lock and run in production-mode or c...
|
Surface Finish |
The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and RF bias power as needed, difficult to remove layer...
|
Cleaning Equipment |
The Minilock-Orion is a Plasma Enhanced Chemical Vapor Deposition System (PECVD) with a vacuum loadlock that produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets al...
|
Coating Equipment |
The Orion PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line produ...
|
Coating Equipment |
The Minilock-Phantom is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform. The system has been designed to meet all the safety and equipment needs for the most challenging processes including etch applications that require corrosive chemistries.
<...
|
Surface Finish |
The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform.
<...
|
Surface Finish |