Trion Technology

Trion provides versatile plasma equipment (ICP-RIE, PECVD, PVD, Ashers, and more) to enable our customers in the MEMS, Semiconductor, LED, RF Power, F.A., Opto-, III-V, Wafer Level Packaging, Thin Film Head, and Solar industries.

Manufacturer

Since its founding in 1989, Trion Technology, Inc. has become the largest domestic US supplier of custom Plasma Etch and Deposition Equipment. We also have a significant presence in Asia with equipment in Japan, Taiwan, Philippines, China, Malaysia and Singapore.

Trion manufactures a wide variety of systems for the Compound Semiconductor, MEMS, Opto-Electronic and other markets. Our products feature the smallest footprint and lowest cost systems in the industry with proven production reliability. If you wish anything from full-blown production cluster tools to a simple laboratory system, Trion makes it.

Products we offer:
Plasma Etch Systems, Plasma Deposition Systems, Stripping Systems, GaN Etch, GaAs Etch, SiO2 Etch, Si02 Deposition, Si3N4 Etch, Si3N4 Deposition and more.

Trion Technology Postings

9 products »

Sirus T2 - Table Top Reactive Ion Etch (RIE) System

The Sirus T2 Reactive Ion Etcher is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment....

Surface Finish

Sirus T2 - Table Top Reactive Ion Etch (RIE) System

Gemini - Multi-Chamber Stripper

The Gemini is the most compact, inexpensive and versatile system, which can handle 100-300mm wafers. This multi-chamber, high throughput stripping system is designed specifically for the demands of today's production fabs. By employing ICP, mi...

Cleaning Equipment

Gemini - Multi-Chamber Stripper

Titan Loadlocked RIE or PECVD with Vacuum Cassette Elevator

The Titan is a very compact, fully automated, vacuum loadlocked plasma system for semi-conductor production. Available in either Reactive Ion Etch (RIE) configuration, High Density Inductive Coupled Plasma (HDICP) or Plasma Enhanced Chemical Vapor...

Surface Finish

Titan Loadlocked RIE or PECVD with Vacuum Cassette Elevator

Oracle - Loadlocked RIE/PECVD with Vacuum Cassette Elevator

The Oracle is the smallest and most flexible full production cluster system on the market. The system consists of a central vacuum transport (CVT), vacuum cassette elevators and up to four process reactors. These process reactors are docked to the...

Surface Finish

Oracle - Loadlocked RIE/PECVD with Vacuum Cassette Elevator

Apollo Stripper

The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and...

Cleaning Equipment

Apollo Stripper

Minilock-Orion - PECVD System with a Vacuum Loadlock

The Minilock-Orion is a Plasma Enhanced Chemical Vapor Deposition System (PECVD) with a vacuum loadlock that produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage...

Coating Equipment

Minilock-Orion - PECVD System with a Vacuum Loadlock

Orion - Plasma Enhanced Chemical Vapor Deposition (PECVD) System

The Orion PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requi...

Coating Equipment

Orion - Plasma Enhanced Chemical Vapor Deposition (PECVD) System

Minilock-Phantom - Reactive Ion Etcher (RIE) with a Vacuum Loadlock

The Minilock-Phantom is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform. The system has been designed to meet all the safety and equipment needs for the most challenging processes including etch applica...

Surface Finish

Minilock-Phantom - Reactive Ion Etcher (RIE) with a Vacuum Loadlock

Phantom - Reactive Ion Etch (RIE) System

The Phantom RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design...

Surface Finish

Phantom - Reactive Ion Etch (RIE) System
Comprehensive Analytical Services and Support

FPC* - Fluid Pressure Control - Dispensing Pump