Trion APO111 Apollo Photoresist Strip System
Company Information:
Name: |
Trion APO111 Apollo Photoresist Strip System |
Category: |
|
Offered by: |
|
Trion APO111 Apollo Photoresist Strip System Description:
https://www.equipnet.com/trion-apo111-apollo-photoresist-strip-system-listid-601307/
Trion APO111 Apollo Photoresist Strip System
Ask Price: $60,000.00 USD or Make An Offer
Location: FL, USA
Level of Removal: Still Installed
Your currency: $60,000.00 USD
*All offers are submitted in Seller’s Acceptable Currency
Equipment Description:
Trion APO111 Apollo Photoresist Strip System
Includes as standard:
- Apollo III reactor radially designed plenum
- Genmark 3-Axis pick and place robot
- System controller (includes Pentium computer and touch screen interface)
- Inductively coupled plasma source with 1250 watt 13.56 MHz RF generator
- One each mass flow controller (O2) (Expansion available to three total MFC's)
- Temperature control of bottom electrode from 50C to 250C
- Automatic pressure control
- Optical endpoint detection system
- Additional monitor and VGA port
- 60 cfm non-corrosive dry pump; Ebara S20P
- Emergency Off and AC distribution
- Installation for maintenance and operator
- 12 Month service warranty (includes parts and labor)
Options:
- Recirculating temperature controller (SMC HRS012-AN-20)
- Custom end effector (heated with custom vacuum configuration)
- Additional Optical endpoint detection system for O2 plasma process and installation
- Integration of RS-232 Barcode Scanner to system computer
- ICP Matching Network presets
- Software Version: Apollo_2.51_Bld3
- Note: Wafer Size Configured To: 100 mm; Wafer Size Capacity: 300 mm
Specifications:
- Manufacturer Name: Trion Technology
- Year: 2016
- Serial Number: APO 111 5597 #13
- CE marked: NO
- Model: APO111
- Voltage: 220 VOLTS
- Frequency: 60 HERTZ
- Phase: 3
- Current: 15 AMPS
- Dimensions: Standard- 95 x 22 x 62 IN - 570 LBS Metric- 2413.00 x 558.80 x 1574.80 mm - 258.55 kg
Additional General Information:
|
General Description: |
Trion Apollo Plasma Asher |
|
Tool ID: |
TRION13 |
|
Fab Process: |
Resist Removal, Descum |
|
Vendor/ Manufacturer: |
Trion Technology |
|
Model Number: |
APO111 |
|
Serial number: |
APO 111 5597 #13 |
|
Year of manufacture: |
2016 |
|
Country of Origin: |
US |
|
Qorvo Asset number(s): |
6581 |
|
Wafer size configured to: Wafer size upgradable to (if known): |
100mm 300mm |
|
Software version: |
Apollo_2.51_Bld3 |
|
Tool Status: (disconnected, in warehouse, crated, cold shutdown in fab, online, running): if not crated please list date expected to be moved out: |
Disconnected, currently stored in Fab. |
Hardware Config:
|
If good include a check, quantity included and describe |
|
|
Main system |
|
|
Process chambers (Qty and status): |
1 |
|
Handling system: |
Genmark robot |
|
Other Hardware configuration: |
1250W 13.56MHz ICP Matching Network Bottom electrode Temp control, range 50C-250C Automatic pressure control |
|
Options included: |
Heated end effector |
|
System condition/ last used: |
Last used 4/5/18 |
|
Known Faulty parts / Major missing Components (if none please specify): |
Idled as working tool |
|
SMIF System /Load ports |
No |
|
Upgrades/ Special features: |
N/A |
|
Facilities: Supply Voltage, sub fab items |
220V, 15A, 3P |
|
Refurb history |
N/A |
|
Support Equipment Pumps sold with: Chillers sold with: |
1 Ebara S20P 1 SMC HRS012-AN-20 |
|
Used for : (please list metals or chemicals used in processing) : |
Oxygen etchant used for organic material removal. |
|
Decon Completed?: |
N/A |
For more information contact: prummel@equipnet.com
Trion APO111 Apollo Photoresist Strip System was added in Sep 2019
Trion APO111 Apollo Photoresist Strip System has been viewed 130 times
1 More Products from EquipNet, Inc. :
