Oct 10, 2012 
ZESTRON, the globally leading provider of high precision cleaning products and services, is pleased to announce that Umut Tosun, M.S.Chem.Eng., Application Technology Manager at ZESTRON America, will present “A Comparative Cleaning Study to Showcase the Effective Removal of OA Flux Residues” at SMTA International 2012.
Increased densities, reduced component sizes and standoff heights as well as a large variety of component packages are all contributing factors that will be the driving force for DI-water users to start looking into introducing the appropriate cleaning agent to their process. This study addresses the process solution alternative to pure DI-water processes that will produce the required cleanliness levels and thereby guarantee the long-term reliability of assemblies.
Mr. Tosun will also represent ZESTRON for the Doctor’s Hours event at SMTAI 2012. He will be available to personally answer your cleaning questions at ZESTRON’s booth #311 from 9:00 am to 1:00 pm on Tuesday, October 16 and 1:00 pm to 5:00 pm on Wednesday, October 17.
For more information about ZESTRON’s extensive product lines, cleaning process solutions and services as well as our free of charge webinar this month titled “Low Standoff Cleaning,” please visit ZESTRON’s booth #311 at SMTAI 2012. Our sales and engineering team stands ready to provide comprehensive solutions to your cleaning needs.
ZESTRON:Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With five worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.
For additional information and to tour one of our unparalleled technical centers, please email infoUSA@zestron.com.
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