Oct 29, 2013 
ZESTRON, the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry, is pleased to announce that Axel Vargas, Application Engineer, ZESTRON, is a featured presenter at the 2013 SMTA Guadalajara Tech Forum and Expo. Mr. Vargas will present “Determine Critical Cleaning Process Parameters for QFNs” in Spanish on October 30th.
When partially removed or untouched residues remain underneath QFN or MLF packages, the risk of component failure is greatly increased. Through this presentation, “Determine Critical Cleaning Process Parameters for QFNs,” Axel Vargas, A.S.Inst.Eng., discusses the results of a technical study yielding the optimal cleaning solution for these low standoff components. Considering both water soluble lead-free and no-clean lead-free pastes and employing a dynamic surfactant cleaning agent in an inline cleaner, these critical cleaning process parameters were identified, analyzed and confirmed.
Mr. Vargas, A.S.Inst.Eng., is an active member of the Surface Mount Technology Association as well as the IPC. He has contributed extensively to comprehensive lead-free and eutectic screening studies, conducted at ZESTRON’s Technical and Analytical Centers.
The 2013 SMTA Guadalajara Tech Forum and Expo is scheduled for October 30th- 31st at the Crowne Plaza Guadalajara, Mexico. For more information and to register for this free event, please visit SMTA Guadalajara.
Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With six worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.
For additional information and to tour one of our unparalleled technical centers, please visit www.zestron.com.
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